TEM sample preparation using focused ion beam - capabilities and limits
Veröffentlichungsart | Zeitschriften-/Journalbeitrag (peer-reviewed) |
---|---|
Medien | Microscopy Today |
Veröffentlichungsdatum | 2003-07-30 |
Band | 2003/11 |
Heft | 2 |
Seiten | 22-25 |
DOI | |
Zitierung | Engelmann, Hans-Jürgen; Volkmann, Beate; Ritz, Yvonne; Saage, Holger; Stegmann, H.; deRobillard, Quentin; Zschech, E. (2003): TEM sample preparation using focused ion beam - capabilities and limits. Microscopy Today 2003/11 (2), S. 22-25. DOI: 10.1017/S1551929500052457 |
Peer Reviewed | Ja |
Autoren |
Hans-Jürgen Engelmann |